A Current Instability in TiO2 Thin Film
- 1 September 1970
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 9 (9)
- https://doi.org/10.1143/jjap.9.1078
Abstract
The current instability is observed in the sputtered TiO2 thin films of Au-TiO2-Ti sandwich system under the application of positive bias on Au electrode. The process of the present current instability is studied in relation to the hydrogen ion conduction in the TiO2 thin films. As a result, the process is conjectured as follows: 1) dissociation of adsorbed water at Au-TiO2 interface, 2) injection of H+ into TiO2 at the positive bias, 3) migration of H+ through TiO2 under the applied field. Dissociation of water results from a coarse texture of the film surface. From the current response at the recovery of the current instability, the diffusion activation energy of H+ in the TiO2 films is estimated at 0.07 eV which is in good agreement with the value in TiO2 single crystal.Keywords
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