A monolithically integrated AlGaAs/GaAs p-i-n/FET Photoreceiver by MOCVD

Abstract
An AlGaAs/GaAs p-i-n photodiode and a GaAs FET have been monolithically integrated on a GaAs substrate by using the metal-organic chemical vapor deposition (MOCVD) technique and by applying a new interconnection technique. A current amplification characteristic consistent to the device parameters has been demonstrated. This result indicates a suitability of MOCVD to realize the monolithic integration of p-i-n/FET photoreceiver.