X-ray photoelectron spectroscopy: A powerful tool for a better characterization of thin film materials
Open Access
- 1 May 1999
- journal article
- Published by Springer Nature in Bulletin of Materials Science
- Vol. 22 (3), 607-614
- https://doi.org/10.1007/bf02749975
Abstract
No abstract availableKeywords
This publication has 15 references indexed in Scilit:
- Amorphous lithium cobalt and nickel oxides thin films: preparation and characterization by RBS and PIGEThin Solid Films, 1998
- New amorphous molybdenum oxysulfide thin films their characterization and their electrochemical propertiesJournal of Power Sources, 1995
- X-ray photoelectron spectroscopy characterization of amorphous molybdenum oxysulfide thin filmsThin Solid Films, 1995
- The state of the oxygen at the surface of polycrystalline cobalt oxideJournal of Electron Spectroscopy and Related Phenomena, 1995
- XPS analysis of lithium intercalation in thin films of molybdenum oxysulphidesSurface and Interface Analysis, 1994
- XPS study of thin films of titanium oxysulfidesSurface Science, 1991
- Analysis of molybdenum(3d) XPS spectra of supported molybdenum catalysts: an alternative approachThe Journal of Physical Chemistry, 1991
- New positive-electrode materials for lithium thin film secondary batteriesMaterials Science and Engineering B, 1989
- Interpretation of the x-ray photoemission spectra of cobalt oxides and cobalt oxide surfacesSurface Science, 1976
- High-Resolution X-Ray Photoemission Spectrum of the Valence Bands of GoldPhysical Review B, 1972