Ion-beam-induced intermixing of surface layers
- 15 October 1979
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 63 (1), 31-36
- https://doi.org/10.1016/0040-6090(79)90095-6
Abstract
No abstract availableKeywords
This publication has 10 references indexed in Scilit:
- Ion-beam-induced formation of the PdSi silicideApplied Physics Letters, 1979
- Formation of Si-enriched metastable compounds in the Pt-Si system using ion bombardment and post annealingPhysics Letters A, 1979
- Ion-beam-induced silicide formationApplied Physics Letters, 1979
- Ion implantation in tribology and corrosion scienceJournal of Vacuum Science and Technology, 1978
- Annealing behavior and selected applications of ion-implanted alloysJournal of Vacuum Science and Technology, 1978
- Amorphous metals and ion implantationJournal of Vacuum Science and Technology, 1978
- Metastable alloy formationJournal of Vacuum Science and Technology, 1978
- Limits of composition achievable by ion implantationJournal of Vacuum Science and Technology, 1978
- Ion implantation as an ultrafast quenching technique for metastable alloy production: The Ag-Cu systemApplied Physics Letters, 1977
- Lattice-site location of ion-implanted impurities in copper and other fcc metalsPhysical Review B, 1976