Dependence of Thin Oxide Films Quality on Surface Micro-Roughness
- 1 January 1991
- proceedings article
- Published by Institute of Electrical and Electronics Engineers (IEEE)
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Future trends and applications of ultra-clean technologyPublished by Institute of Electrical and Electronics Engineers (IEEE) ,2003
- Surface active buffered hydrogen fluoride having excellent wettability for ULSI processingIEEE Transactions on Semiconductor Manufacturing, 1990
- Particle-free wafer cleaning and drying technologyIEEE Transactions on Semiconductor Manufacturing, 1989