Future trends and applications of ultra-clean technology
- 7 January 2003
- proceedings article
- Published by Institute of Electrical and Electronics Engineers (IEEE)
- Vol. 730, 49-52
- https://doi.org/10.1109/iedm.1989.74225
Abstract
No abstract availableThis publication has 4 references indexed in Scilit:
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- Low-temperature silicon selective deposition and epitaxy on silicon using the thermal decomposition of silane under ultraclean environmentApplied Physics Letters, 1989
- Electrical characterization of epitaxial silicon films formed by a low kinetic energy particle processApplied Physics Letters, 1989
- Low-temperature silicon epitaxy by low-energy bias sputteringApplied Physics Letters, 1988