Pulsed laser etching of high T c superconducting films
- 5 October 1987
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 51 (14), 1112-1114
- https://doi.org/10.1063/1.98756
Abstract
Etching of Y‐Ba‐Cu‐O superconducting thin films has been accomplished using a pulsed excimer laser (248 nm, 30 ns). Etch depth as a function of the number of laser pulses was linear over a wide range of incident laser energy densities. An etch threshold energy density of 0.11 J/cm2 was observed and etch rate per pulse scaled linearly with the logarithm of the incident energy density. The dependence is adequately explained by a linear absorption model with an inverse absorption length of 2.3×105 cm−1.Keywords
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