Chemical and Electrical Behaviour of Ion Implanted SiO2 Films
- 1 January 1971
- book chapter
- Published by Springer Nature
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- Implications of ion implantation technology on ion implanted active devices in siliconRadiation Effects, 1971
- LATTICE EXPANSION AND STRAIN IN ION-BOMBARDED GaAs AND SIApplied Physics Letters, 1970
- ION-BOMBARDMENT-ENHANCED ETCHING OF SILICONApplied Physics Letters, 1969
- Ion implantation in semiconductors—Part I: Range distribution theory and experimentsProceedings of the IEEE, 1968
- Electronic conduction through thin unsaturated oxide layersPhysics Letters A, 1967