Characterization of trimethylaluminum-N2O—He glow discharge in plasma-enhanced chemical vapor deposition of aluminum oxide films
- 1 March 1995
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 258 (1-2), 67-74
- https://doi.org/10.1016/0040-6090(95)80048-4
Abstract
No abstract availableKeywords
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