Optimization of parameters of a dedicated synchrotron radiation source for technology
- 15 April 1983
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research
- Vol. 208 (1-3), 11-18
- https://doi.org/10.1016/0167-5087(83)91096-7
Abstract
No abstract availableThis publication has 3 references indexed in Scilit:
- X-Ray Silicon Target Preparation for X-Ray Lithographic SystemJapanese Journal of Applied Physics, 1979
- Flash X-ray MicroscopyScience, 1979
- Submicrosecond X-ray lithographyElectronics Letters, 1978