Desorption−Ionization Mass Spectrometry Using Deposited Nanostructured Silicon Films
- 10 February 2001
- journal article
- Published by American Chemical Society (ACS) in Analytical Chemistry
- Vol. 73 (6), 1292-1295
- https://doi.org/10.1021/ac001081k
Abstract
We present a method for desorption ionization on silicon based on novel column/void-network-deposited silicon thin films. A number of different peptides and proteins in the < or = 6000 Daltons range are analyzed by time-of-flight mass spectrometry in this demonstration of our approach. A variety of sample preparation conditions, including the use of chemical additives, surface treatments, and sample purification are used to show the potential of mass analysis using deposited column/void-network silicon films for high throughput proteomic screening.Keywords
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