Characteristics of indium tin oxide films deposited by bias magnetron sputtering
- 15 June 2002
- journal article
- Published by Elsevier in Materials Science and Engineering B
- Vol. 94 (1), 106-110
- https://doi.org/10.1016/s0921-5107(02)00090-9
Abstract
No abstract availableThis publication has 11 references indexed in Scilit:
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