Optimization of sputtered ITO films with respect to the oxygen partial pressure and substrate temperature
- 1 February 1997
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 295 (1-2), 151-155
- https://doi.org/10.1016/s0040-6090(96)09167-5
Abstract
No abstract availableKeywords
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