Determination of optical constants. A null-method for non-absorbing surface films
- 16 March 1976
- journal article
- research article
- Published by Wiley in Physica Status Solidi (a)
- Vol. 34 (1), 69-72
- https://doi.org/10.1002/pssa.2210340103
Abstract
No abstract availableKeywords
This publication has 7 references indexed in Scilit:
- Combined reflection and transmission thin-film ellipsometry: a unified linear analysisApplied Optics, 1975
- Ellipsometric function of a film–substrate system: Applications to the design of reflection-type optical devices and to ellipsometry*Journal of the Optical Society of America, 1975
- Generalized Ellipsometric Method for the Absorbing Substrate Covered with a Transparent-Film System Optical Constants of Silicon at 3655 Å*Journal of the Optical Society of America, 1972
- Optical properties of non-crystalline Si, SiO, SiOx and SiO2Journal of Physics and Chemistry of Solids, 1971
- Determination of Optical Constants: A Null-MethodPhysica Status Solidi (a), 1970
- Ellipsometric Technique for Obtaining Substrate Optical ConstantsJournal of Applied Physics, 1970
- Ellipsometric Method for the Determination of All the Optical Parameters of the System of an Isotropic Nonabsorbing Film on an Isotropic Absorbing Substrate Optical Constants of Silicon*Journal of the Optical Society of America, 1969