Thin Film Growth of YBa2Cu3O7-x by ECR Oxygen Plasma Assisted Reactive Evaporation
- 1 April 1989
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 28 (4A), L635
- https://doi.org/10.1143/jjap.28.l635
Abstract
A new apparatus equipped with an ECR oxygen plasma source, a co-evaporation system of Y, Ba and Cu and a differential pumping system was developed. YBa2Cu3O7-x superconducting films were obtained at a substrate temperature of 450–500°C. The critical temperatures of films deposited on SrTiO3, MgO and Si substrates were 87 K, 80 K and 63 K, respectively. These properties were closely related to the crystallinity of the film.Keywords
This publication has 12 references indexed in Scilit:
- As-Deposited Superconducting Ba2YCu3O7-y Films Using ECR Ion Beam OxidationJapanese Journal of Applied Physics, 1988
- Preparation of Y2Ba4Cu8O20−xthin films by thermal coevaporationApplied Physics Letters, 1988
- Y-Ba-Cu-O Thin Film on Si SubstrateJapanese Journal of Applied Physics, 1988
- Deposition of superconducting Y-Ba-Cu-O films at 400 °C without post-annealingApplied Physics Letters, 1988
- Oxidation of cold copper films with oxygen radicalsSuperconductor Science and Technology, 1988
- Electron-Cyclotron-Resonance Microwave Plasma Oxidation of Er1Ba2Cu3Oy Superconductive CeramicsJapanese Journal of Applied Physics, 1988
- Single-Crystal YBa2Cu3O7-x Thin Films by Activated Reactive EvaporationJapanese Journal of Applied Physics, 1988
- Critical current densities and transport in superconducting YBa2Cu3O7−δ films made by electron beam coevaporationApplied Physics Letters, 1987
- Preparation of YBa2Cu3O7-x Superconducting Thin Films by RF-Magnetron SputteringJapanese Journal of Applied Physics, 1987
- Effect of Oxygen Deficiency on the Crystal Structure and Superconducting Properties of the Ba2YCu3OyJapanese Journal of Applied Physics, 1987