The epitaxial growth and properties of p-type silicon on spinel using a dual-rate deposition technique
- 1 April 1972
- journal article
- Published by Elsevier in Journal of Crystal Growth
- Vol. 12 (4), 327-333
- https://doi.org/10.1016/0022-0248(72)90305-3
Abstract
No abstract availableThis publication has 10 references indexed in Scilit:
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