Pattern replication accuracy in 1 : 1 SR lithography
- 30 April 1993
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 21 (1-4), 71-74
- https://doi.org/10.1016/0167-9317(93)90029-5
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Study of radiation stability in SiN x-ray mask membranes for synchrotron radiation lithographyMicroelectronic Engineering, 1992
- Modeling of illumination effects on resist profiles in x-ray lithographyPublished by SPIE-Intl Soc Optical Eng ,1991
- Development of centrally controlled synchrotron radiation lithography beamline systemJournal of Vacuum Science & Technology B, 1990