Oxidation of plasma enhanced chemical vapour deposited silicon nitride and oxynitride films
- 1 October 1989
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 39 (1-4), 25-32
- https://doi.org/10.1016/0169-4332(89)90417-0
Abstract
No abstract availableThis publication has 6 references indexed in Scilit:
- Hydrogen in oxidized silicon oxynitride thin filmsApplied Surface Science, 1988
- Oxidation behaviour of LPCVD silicon oxynitride filmsApplied Surface Science, 1988
- Annealing of plasma silicon oxynitride filmsJournal of Applied Physics, 1986
- Plasma-enhanced growth and composition of silicon oxynitride filmsJournal of Applied Physics, 1986
- Hydrogen in low-pressure chemical-vapor-deposited silicon (oxy)nitride filmsJournal of Applied Physics, 1986
- The hydrogen content of plasma-deposited silicon nitrideJournal of Applied Physics, 1978