The Critical Role of Solvent Evaporation on the Roughness of Spin-Cast Polymer Films
- 6 June 2001
- journal article
- Published by American Chemical Society (ACS) in Macromolecules
- Vol. 34 (14), 4669-4672
- https://doi.org/10.1021/ma001440d
Abstract
No abstract availableThis publication has 16 references indexed in Scilit:
- Dewetting of an Evaporating Thin Liquid Film: Heterogeneous Nucleation and Surface InstabilityPhysical Review Letters, 1998
- Capillary flow as the cause of ring stains from dried liquid dropsNature, 1997
- A model for drying of viscoelastic polymer coatingsAIChE Journal, 1996
- Solvent concentration measurement for spin coatingJournal of Applied Polymer Science, 1995
- How does a thin wetted film dry up?Physical Review Letters, 1994
- Influence of solvent and molecular weight on thickness and surface topography of spin‐coated polymer filmsPolymer Engineering & Science, 1990
- Effect of early solvent evaporation on the mechanism of the spin‐coating of polymeric solutionsPolymer Engineering & Science, 1990
- An investigation of spin coating of electron resistsPolymer Engineering & Science, 1979
- Characteristics of resist films produced by spinningJournal of Applied Physics, 1978
- Rheology and Modeling of the Spin Coating ProcessIBM Journal of Research and Development, 1977