Sputtering yield of vapor-deposited TiC films by low energy deuterium ions
- 31 May 1988
- journal article
- other
- Published by Elsevier in Journal of Nuclear Materials
- Vol. 152 (2), 328-330
- https://doi.org/10.1016/0022-3115(88)90344-3
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Comparison of the properties of ion-plated titanium carbide films prepared by different activation methodsThin Solid Films, 1984
- Light ion sputtering of low Z materials in the temperature range 20–1100°CJournal of Nuclear Materials, 1984
- Thermal and mechanical properties of vapour-deposited TiC coatings for the first wall of a fusion reactorThin Solid Films, 1983
- Properties of TixC1 − x films coated on molybdenum by magnetron sputteringThin Solid Films, 1983