Properties of TixC1 − x films coated on molybdenum by magnetron sputtering
- 1 March 1983
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 101 (3), 233-242
- https://doi.org/10.1016/0040-6090(83)90250-x
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
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- The Effect of Substrate Temperature on the Structure of Titanium Carbide Deposited by Activated Reactive EvaporationJournal of Vacuum Science and Technology, 1972
- Activated Reactive Evaporation Process for High Rate Deposition of CompoundsJournal of Vacuum Science and Technology, 1972