Analysis of cyclic deposition of diamond
- 1 December 1991
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 70 (11), 7132-7136
- https://doi.org/10.1063/1.349796
Abstract
No abstract availableKeywords
This publication has 8 references indexed in Scilit:
- Mole fractions of H, CH3, and other species during filament-assisted diamond growthApplied Physics Letters, 1991
- Detailed surface and gas-phase chemical kinetics of diamond depositionPhysical Review B, 1991
- Mechanism for diamond growth from methyl radicalsApplied Physics Letters, 1990
- The role of hydrogen in vapor deposition of diamondJournal of Applied Physics, 1989
- On the role of oxygen and hydrogen in diamond-forming dischargesJournal of Applied Physics, 1989
- Diamond—Ceramic Coating of the FutureJournal of the American Ceramic Society, 1989
- Low-Pressure, Metastable Growth of Diamond and "Diamondlike" PhasesScience, 1988
- Growth mechanism of vapor-deposited diamondJournal of Materials Research, 1988