W-B-N diffusion barriers for Si/Cu metallizations
- 1 June 1995
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 262 (1-2), 218-223
- https://doi.org/10.1016/0040-6090(94)05810-5
Abstract
No abstract availableThis publication has 17 references indexed in Scilit:
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