Mass flow limitations in reactive sputtering
- 1 August 1985
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 130 (3-4), 307-313
- https://doi.org/10.1016/0040-6090(85)90361-x
Abstract
No abstract availableThis publication has 6 references indexed in Scilit:
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- The analysis and automatic control of a reactive d.c. magnetron sputtering processThin Solid Films, 1983
- Investigation of Tin films reactively sputtered using a sputter gunThin Solid Films, 1983
- ZrN diffusion barrier in aluminum metallization schemesThin Solid Films, 1983
- Diffusion barriers in thin filmsThin Solid Films, 1978
- Mechanism of rf reactive sputteringJournal of Applied Physics, 1975