Oxygen substitution in sputter-deposited MoS2 films studied by extended X-ray absorption fine structure, X-ray photoelectron spectroscopy and X-ray diffraction
- 10 December 1990
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 43-44, 640-651
- https://doi.org/10.1016/0257-8972(90)90008-z
Abstract
No abstract availableThis publication has 15 references indexed in Scilit:
- TEM lattice imaging of the nanostructure of early-growth sputter-deposited MoS2solid lubricant filmsJournal of Materials Research, 1990
- MoS2−xOx solid solutions in thin films produced by rf-sputter-depositionJournal of Materials Research, 1990
- Laser surface processing of molybdenum disulfide thin filmsThin Solid Films, 1989
- Orientation of rf-sputter-deposited MoS2 filmsJournal of Materials Research, 1989
- Chemical and Structural Effects on the Lubrication Properties of Sputtered MoS2FilmsTribology Transactions, 1988
- Crystallinity of rf-sputtered MoS2 filmsJournal of Materials Research, 1987
- Preparation and properties of different types of sputtered MoS2 filmsWear, 1987
- Stoichiometry and friction properties of sputtered MoSx layersThin Solid Films, 1985
- Morphological properties of sputtered MoS2 filmsWear, 1983
- Morphological and frictional behavior of sputtered MoS2 filmsThin Solid Films, 1982