Direct determination of the valence-band offsets at Ga0.47In0.53As/InP and InP/Ga0.47In0.53As heterostructures by ultraviolet photoemission spectroscopy

Abstract
Ultraviolet photoemission spectroscopy has been used to study the valence‐band offsets at GaInAs/InP and InP/GaInAs heterostructures grown by metalorganic molecular‐beam epitaxy. High‐resolution In‐4d/Ga‐3d core levels were used. The measured values are 440±50 meV for the ‘‘direct’’ (GaInAs grown on InP) interface and 260±50 meV for the ‘‘inverse’’ interface. This band‐offset asymmetry is attributed to a difference in the chemical natures of the two interfaces, deduced from the detailed analysis of the core‐level spectra.