Control of Y2O3-stabilized ZrO2 thin film orientation by modified bias sputtering
- 1 February 1994
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 239 (1), 123-126
- https://doi.org/10.1016/0040-6090(94)90118-x
Abstract
No abstract availableKeywords
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