Resistivity and oxidation of tungsten silicide thin films
- 1 October 1980
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 72 (3), 427-432
- https://doi.org/10.1016/0040-6090(80)90526-x
Abstract
No abstract availableKeywords
This publication has 8 references indexed in Scilit:
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- Kinetics of the thermal oxidation of WSi2Applied Physics Letters, 1979
- 1 /spl mu/m MOSFET VLSI technology. VII. Metal silicide interconnection technology - A future perspectiveIEEE Journal of Solid-State Circuits, 1979
- Oxidation of sputtered molybdenum silicide thin filmsApplied Physics Letters, 1978
- Oxidation mechanisms in WSi2 thin filmsApplied Physics Letters, 1978
- A New MOS Process Using MoSi2as a Gate MaterialJapanese Journal of Applied Physics, 1978
- Moving Resistive Wire ElectrodesJournal of the Electrochemical Society, 1977