Anisotropic bending during epitaxial growth of mixed crystals on GaAs substrate
- 1 October 1972
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 43 (10), 4254-4256
- https://doi.org/10.1063/1.1660904
Abstract
Crystals of GaxIn1−xAs and GaAsxP1−x were deposited on GaAs substrate from the vapor phase, and the deformation properties of these systems accompanying the heteroepitaxial growth were investigated. When the crystal surface of the substrate was {100}, it was found that there was an evident anisotropy of bending in the directions of and , and this phenomenon cannot be explained by the simple bimetal model. The influence of the crystalline surface of the substrate on the deformation was also checked.
Keywords
This publication has 4 references indexed in Scilit:
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- Preferential Etching and Etched Profile of GaAsJournal of the Electrochemical Society, 1971
- Preparation of Epitaxial Ga[sub x]In[sub 1−x]AsJournal of the Electrochemical Society, 1967
- Thermal and Electrical Transport in InAs-GaAs AlloysJournal of Applied Physics, 1966