Chemical vapor deposition of smooth α-Al2O3 films on nickel base superalloys as diffusion barriers
- 1 November 1999
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 120-121, 16-21
- https://doi.org/10.1016/s0257-8972(99)00333-3
Abstract
No abstract availableKeywords
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