Etching mechanism and atomic structure of H-Si(111) surfaces prepared in NH4F
- 1 July 1995
- journal article
- Published by Elsevier in Electrochimica Acta
- Vol. 40 (10), 1353-1360
- https://doi.org/10.1016/0013-4686(95)00071-l
Abstract
No abstract availableKeywords
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