Catalytic decomposition of SiH4 on a hot filament
- 1 September 2001
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 395 (1-2), 42-46
- https://doi.org/10.1016/s0040-6090(01)01204-4
Abstract
No abstract availableKeywords
Funding Information
- Ministry of Education, Culture, Sports, Science and Technology (11450297)
This publication has 13 references indexed in Scilit:
- Diagnostics of the gas-phase thermal decomposition of Si2H6 using vacuum ultraviolet photoionizationChemical Physics Letters, 2000
- Si + SiH4 Reactions and Implications for Hot-Wire CVD of a-Si:H: Computational StudiesMRS Proceedings, 2000
- Photolysis of Disilane at 193 nmThe Journal of Physical Chemistry A, 1999
- Formation of Silicon-Based Thin Films Prepared by Catalytic Chemical Vapor Deposition (Cat-CVD) MethodJapanese Journal of Applied Physics, 1998
- Arrhenius parameters for the reaction of H atoms with SiH4Journal of the Chemical Society, Faraday Transactions, 1997
- Mechanism and Product Branching Ratios of the SiH3 + SiH3 ReactionThe Journal of Physical Chemistry, 1996
- Deposition of device quality, low H content amorphous siliconJournal of Applied Physics, 1991
- Rate constants for the reactions of hydrogen atoms with SiHnF4 − n (n = 4, 3, 2)Chemical Physics Letters, 1990
- Theoretical studies of the insertion reactions of atomic carbon and silicon into methane and silaneThe Journal of Physical Chemistry, 1989
- Catalytic Chemical Vapor Deposition (CTC–CVD) Method Producing High Quality Hydrogenated Amorphous SiliconJapanese Journal of Applied Physics, 1986