Organometallic Chemical Vapor Deposition of Palladium under Very Mild Conditions of Temperature in the Presence of a Low Reactive Gas Partial Pressure
- 1 January 1996
- journal article
- research article
- Published by American Chemical Society (ACS) in Chemistry of Materials
- Vol. 8 (10), 2481-2485
- https://doi.org/10.1021/cm960106m
Abstract
No abstract availableKeywords
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