Statistical approach for optimizing sputtering conditions of highly oriented aluminum nitride thin films
- 1 March 1998
- journal article
- research article
- Published by Elsevier in Thin Solid Films
- Vol. 315 (1-2), 62-65
- https://doi.org/10.1016/s0040-6090(97)00697-4
Abstract
No abstract availableKeywords
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