Transparent and conducting ZnO(:Al) films deposited by simultaneous RF- and DC-excitation of a magnetron
- 1 April 1998
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 317 (1-2), 413-416
- https://doi.org/10.1016/s0040-6090(97)00633-0
Abstract
No abstract availableThis publication has 4 references indexed in Scilit:
- Influence of discharge parameters on the layer properties of reactive magnetron sputtered ZnO:Al filmsThin Solid Films, 1994
- CuInS2 based thin film solar cell with 10.2% efficiencyApplied Physics Letters, 1993
- Cylindrical magnetron discharges. I. Current-voltage characteristics for dc- and rf-driven discharge sourcesJournal of Applied Physics, 1989
- Pure element sputtering yields using 500–1000 eV argon ionsThin Solid Films, 1981