Anomalous electrical resistivity and defects incompounds
- 1 March 1977
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review B
- Vol. 15 (5), 2570-2580
- https://doi.org/10.1103/physrevb.15.2570
Abstract
The temperature dependence of the electrical resistivity of Nb-Ge, Si, Ge, and Nb is reported for a variety of samples produced with differing chemical composition (for Nb-Ge), preparation conditions, and with varying amounts of -induced defects. The great susceptibility of the structure to defect formation and its profound effects on the physical behavior are shown. The resistance-ratio- correlation previously reported for Nb-Ge is found in Si and Ge. Residual resistivities increase far more rapidly with -induced defects in the than in Nb, and at least for Ge, saturate at the highly disordered state where the minimum occurs. Decreasing , no matter how achieved, is accompanied by not only the loss of the Woodard and Cody anomaly in but the loss of almost all the thermal resistivity (electron-phonon interaction) as well. The temperature dependence and the magnitude of are compared with predictions and other published values and some unexpected correlations with are found. The data indicate a defect with universal behavior in the , and of considerable consequence to the superconducting and normal-state behavior.
Keywords
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