Anomalous electrical resistivity and defects inA15compounds

Abstract
The temperature dependence of the electrical resistivity ρ of Nb-Ge, V3Si, V3Ge, and Nb is reported for a variety of samples produced with differing chemical composition (for Nb-Ge), preparation conditions, and with varying amounts of He4-induced defects. The great susceptibility of the A15 structure to defect formation and its profound effects on the physical behavior are shown. The resistance-ratio-Tc correlation previously reported for Nb-Ge is found in V3Si and V3Ge. Residual resistivities increase far more rapidly with He4-induced defects in the A15's than in Nb, and at least for Nb3Ge, saturate at the highly disordered state where the minimum Tc occurs. Decreasing Tc, no matter how achieved, is accompanied by not only the loss of the Woodard and Cody anomaly in ρ(T) but the loss of almost all the thermal resistivity (electron-phonon interaction) as well. The temperature dependence and the magnitude of ρ are compared with predictions and other published values and some unexpected correlations with Tc are found. The data indicate a defect with universal behavior in the A15's, and of considerable consequence to the superconducting and normal-state behavior.