Determination of silicon oxide thickness
- 1 April 1966
- journal article
- research article
- Published by Elsevier in Solid-State Electronics
- Vol. 9 (4), 331-332
- https://doi.org/10.1016/0038-1101(66)90064-5
Abstract
No abstract availableThis publication has 5 references indexed in Scilit:
- Interspecimen Comparison of the Refractive Index of Fused Silica*,†Journal of the Optical Society of America, 1965
- Refractive Indices of Lithium Fluoride and Fused Silica from 2000 to 3000 ÅJournal of the Optical Society of America, 1965
- Thickness measurement of silicon dioxide layers by ultraviolet-visible interference methodSolid-State Electronics, 1964
- Use of Index of Refraction Liquids for the Measurement of the Refractive Index of Thin Transparent Films on SiliconJournal of the Electrochemical Society, 1964
- Reflectance and Photoemission From SiPhysical Review Letters, 1962