A plasma source for the production of thin oxide films
- 1 October 1972
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 12 (2), 453-456
- https://doi.org/10.1016/0040-6090(72)90112-5
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Source à plasma pour la préparation de couches minces de siliceThin Solid Films, 1972
- Epitaxial Thin Films of ZnO on CdS and SapphireJournal of Vacuum Science and Technology, 1969