Source à plasma pour la préparation de couches minces de silice
- 1 August 1972
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 11 (2), 283-288
- https://doi.org/10.1016/0040-6090(72)90054-5
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- Characterization of Silicon Dioxide Films by the Electron ProbeJournal of the Electrochemical Society, 1971
- Some Properties of Silica Film Made by RF Glow Discharge SputteringJapanese Journal of Applied Physics, 1970
- THIN FILM CHARACTERIZATION BY ELECTRON MICROPROBE AND ELLIPSOMETRY: SiO2 FILMS ON SILICONApplied Physics Letters, 1969
- Theory and practice of RF sputteringVacuum, 1967
- Preparation of Oxide Glass Films by Reactive SputteringJournal of the American Ceramic Society, 1963