Preparation of a-Si:H Films by VHF Plasma CVD
- 1 January 1988
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Influence of Plasma Excitation Frequency on Deposition Rate and on Film Properties for Hydrogenated Amorphous SiliconMRS Proceedings, 1987
- Influence of Power-Source Frequency on the Properties of GD a-Si:HJapanese Journal of Applied Physics, 1984
- Low-temperature crystallization of doped a-Si:H alloysApplied Physics Letters, 1980