On-line nanolithography using electron beam-induced deposition technique
- 24 August 2001
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 57-58, 953-958
- https://doi.org/10.1016/s0167-9317(01)00476-2
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Conductive dots, wires, and supertips for field electron emitters produced by electron-beam induced deposition on samples having increased temperatureJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1996
- Fabrication and characterization of platinum nanocrystalline material grown by electron-beam induced depositionJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1995
- Low energy lithography; energy control and variable energy exposureMicroelectronic Engineering, 1995