Elastic and vibrational properties of pseudomorphic FeSi films
- 1 August 1994
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review B
- Vol. 50 (6), 3570-3576
- https://doi.org/10.1103/physrevb.50.3570
Abstract
We analyze the structural, vibrational, and elastic properties of epitaxial novel FeSi films on Si(111) in the CsCl structure by Rutherford-backscattering spectrometry, x-ray-diffraction, infrared transmittance/ reflectance, and Brillouin-light-scattering measurements. By comparing our results for different film thicknesses and by interpreting them on the basis of semiempirical total-energy calculations, we are able to relate the changes in vibrational properties with the progressive strain relaxation as a function of sample thickness. For the thickest film (890 Å) we obtain indications that a structural transition to the (bulk) ε phase is about to take place.Keywords
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