Fabrication of silicon aperture probes for scanning near-field optical microscopy by focused ion beam nano machining
- 30 September 2001
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 57-58, 721-728
- https://doi.org/10.1016/s0167-9317(01)00463-4
Abstract
No abstract availableKeywords
This publication has 10 references indexed in Scilit:
- Ion beam-treated silicon probes operated in transmission and cross-polarized reflection mode near-infrared scanning near-field optical microscopy (NIR-SNOM)Surface and Interface Analysis, 1999
- Nano‐slit probes for near‐field optical microscopy fabricated by focused ion beamsJournal of Microscopy, 1999
- High definition aperture probes for near-field optical microscopy fabricated by focused ion beam millingApplied Physics Letters, 1998
- Focused ion-beam fabrication of fiber probes with well-defined apertures for use in near-field scanning optical microscopyApplied Physics Letters, 1998
- Transmission scanning near-field optical microscopy with uncoated silicon tipsUltramicroscopy, 1998
- Contrast enhancement using polarization-modulation scanning near-field optical microscopy (PM-SNOM)Ultramicroscopy, 1998
- Low-damage specimen preparation technique for transmission electron microscopy using iodine gas-assisted focused ion beam millingJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1995
- Near field microscopy and near field opticsReports on Progress in Physics, 1994
- Computer simulations of sputteringNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1987
- A Monte Carlo computer program for the transport of energetic ions in amorphous targetsNuclear Instruments and Methods, 1980