Deposition of Indium Tin Oxide Films on Acrylic Substrates by Radiofrequency Magnetron Sputtering
- 1 July 1994
- journal article
- Published by Wiley in Journal of the American Ceramic Society
- Vol. 77 (7), 1740-1744
- https://doi.org/10.1111/j.1151-2916.1994.tb07044.x
Abstract
No abstract availableKeywords
This publication has 19 references indexed in Scilit:
- Effect of target-substrate distance on the growth and properties of rf-sputtered indium tin oxide filmsJournal of Applied Physics, 1989
- Transparent, conducting indium tin oxide films formed on low or medium temperature substrates by ion-assisted depositionApplied Optics, 1987
- Ground Radiation Tests and Flight Atomic Oxygen Tests of ITO Protective Coatings for Galileo SpacecraftIEEE Transactions on Nuclear Science, 1986
- Three-step process for depositing indium-tin oxide coatingsApplied Optics, 1984
- Optical properties of thin In-Sn oxide filmsApplications of Surface Science, 1983
- Thin metallic oxides as transparent conductorsThin Solid Films, 1982
- Properties of indium tin oxide thin films prepared by reactive evaporationThin Solid Films, 1981
- Deposition of conducting and transparent thin films of indium tin oxide by reactive ion platingThin Solid Films, 1981
- Fabrication and characterization of indium tin oxide thin films for electroluminescent applicationsThin Solid Films, 1981
- Preparation of conducting and transparent thin films of tin-doped indium oxide by magnetron sputteringApplied Physics Letters, 1980