Fabrication and characterization of indium tin oxide thin films for electroluminescent applications
- 19 June 1981
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 80 (1-3), 143-148
- https://doi.org/10.1016/0040-6090(81)90216-9
Abstract
No abstract availableKeywords
This publication has 9 references indexed in Scilit:
- Large-scale sputtering of indium–tin oxideJournal of Vacuum Science and Technology, 1978
- Effects of heat treatment on the optical and electrical properties of indium–tin oxide filmsJournal of Applied Physics, 1978
- Efficient sprayed In2O3 : Sn n-type silicon heterojunction solar cellApplied Physics Letters, 1977
- Magnetron dc reactive sputtering of titanium nitride and indium–tin oxideJournal of Vacuum Science and Technology, 1977
- Properties of Sn‐Doped In2 O 3 Films Prepared by RF SputteringJournal of the Electrochemical Society, 1975
- Chemical vapor deposition of transparent electrically conducting layers of indium oxide doped with tinThin Solid Films, 1975
- Preparation and properties of reactively co-sputtered transparent conducting filmsThin Solid Films, 1975
- Characterization of transparent conductive thin films of indium oxideJournal of Vacuum Science and Technology, 1975
- Highly Conductive, Transparent Films of Sputtered In[sub 2−x]Sn[sub x]O[sub 3−y]Journal of the Electrochemical Society, 1972