Mechanical integrity of polysilicon films exposed to hydrofluoric acid solutions
- 4 December 2002
- proceedings article
- Published by Institute of Electrical and Electronics Engineers (IEEE)
Abstract
No abstract availableThis publication has 7 references indexed in Scilit:
- Laterally driven polysilicon resonant microstructuresPublished by Institute of Electrical and Electronics Engineers (IEEE) ,2003
- Processing conditions for polysilicon films with tensile strain for large aspect ratio microstructuresPublished by Institute of Electrical and Electronics Engineers (IEEE) ,2003
- Integrated fabrication of polysilicon mechanismsIEEE Transactions on Electron Devices, 1988
- Integrated movable micromechanical structures for sensors and actuatorsIEEE Transactions on Electron Devices, 1988
- Fine-grained polysilicon films with built-in tensile strainIEEE Transactions on Electron Devices, 1988
- A simple technique for the determination of mechanical strain in thin films with applications to polysiliconJournal of Applied Physics, 1985
- Polycrystalline Silicon Micromechanical BeamsJournal of the Electrochemical Society, 1983