Low temperature direct imprint of polyhedral oligomeric silsesquioxane (POSS) resist
- 31 August 2011
- journal article
- research article
- Published by Elsevier BV in Microelectronic Engineering
- Vol. 88 (8), 1997-1999
- https://doi.org/10.1016/j.mee.2011.02.047
Abstract
No abstract availableKeywords
Funding Information
- NaPANIL (FP7-CP-IP 214249)
- LAMAND (FP7-NMP-2009-245565)
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