Real-time control by multiwavelength ellipsometry of plasma-deposited multilayers on glass by use of an incoherent-reflection model
- 1 September 1997
- journal article
- Published by Optica Publishing Group in Applied Optics
- Vol. 36 (25), 6352-6359
- https://doi.org/10.1364/ao.36.006352
Abstract
Real-time control by multiwavelength phase-modulated ellipsometry (PME) of the growth of multilayer structures deposited on transparent glass is presented. The structures consist of plasma-deposited SiO2 and SiNx stacks. A model that takes into account incoherent reflection in the substrate is described and tested. A generalized feedback control method that incorporates the incoherent modeling of the transparent substrate is further applied to the growth of a Fabry–Perot and a standard quarter-wave filter. The resulting optical coatings characterized by spectroscopic PME and transmission measurements show a reproducible precision, with less than 1% error between target and measured spectral responses.Keywords
This publication has 15 references indexed in Scilit:
- Incoherent superposition in ellipsometric measurementsThin Solid Films, 1997
- Real time control of the growth of silicon alloy multilayers by multiwavelength ellipsometryThin Solid Films, 1996
- Real time control of plasma deposited multilayers by multiwavelength ellipsometryApplied Physics Letters, 1996
- Real time monitoring of the growth of transparent thin films by spectroscopic ellipsometryReview of Scientific Instruments, 1996
- Real time monitoring of the growth of transparent thin films by spectroscopic ellipsometryApplied Physics Letters, 1995
- Spectroscopic ellipsometry of thin films on transparent substrates: A formalism for data interpretationJournal of Vacuum Science & Technology A, 1995
- Real-time in situ ellipsometric control of antireflection coatings for semiconductor laser amplifiers using SiOxJournal of Vacuum Science & Technology A, 1993
- Phase modulated ellipsometry from the ultraviolet to the infrared: In situ application to the growth of semiconductorsProgress in Crystal Growth and Characterization of Materials, 1993
- Insitu spectral ellipsometry for real-time measurement and controlApplied Surface Science, 1993
- Deposition error compensation for optical multilayer coatings I Theoretical descriptionApplied Optics, 1992