Bistable defect in silicon: The interstitial-carbon–substitutional-carbon pair
- 1 February 1988
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review Letters
- Vol. 60 (5), 460-463
- https://doi.org/10.1103/physrevlett.60.460
Abstract
By combining several spectroscopic techniques, we have observed a new type of bistable center in electron-irradiated silicon and have identified it as an interstitial-carbon–substitutional-carbon pair. The positive and negative charge states of the defect share a common stable configuration which differs from that for the neutral state by a simple molecular bond rearrangement. Detailed structural models and configurational-coordinate energy surfaces are presented for each of the three charge states.Keywords
This publication has 14 references indexed in Scilit:
- Cd:In—A Critical Positive Test of the Toyozawa Model of Impurity Self-TrappingPhysical Review Letters, 1986
- Configurationally multistable defect in siliconApplied Physics Letters, 1986
- New vacancy-related defects inn-type siliconPhysical Review B, 1986
- Configurationally bistableCcenter in quenched Si:B: Possibility of a boron-vacancy pairPhysical Review B, 1985
- Metastable-defect behavior in silicon: Charge-state-controlled reorientation of iron-aluminum pairsPhysical Review B, 1985
- A bistable defect in electron-irradiated boron-doped siliconJournal of Physics C: Solid State Physics, 1985
- center: A configurationally bistable defect in InP: FePhysical Review B, 1984
- Extrinsic self-trapping and negativein semiconductors: A metastable center in InPPhysical Review B, 1984
- Transient capacitance studies of an electron trap at E c−E T = 0.105 eV in phosphorus-doped siliconJournal of Applied Physics, 1982
- EPR Observation of the Isolated Interstitial Carbon Atom in SiliconPhysical Review Letters, 1976