Cathodic arc plasma deposition of TiC and TiCxN1−x films
- 1 October 1987
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 153 (1-3), 209-218
- https://doi.org/10.1016/0040-6090(87)90183-0
Abstract
No abstract availableKeywords
This publication has 7 references indexed in Scilit:
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- Structure and properties of sputtered titanium carbide and titanium nitride coatingsJournal of Vacuum Science and Technology, 1974
- Structure and microhardness relationships in Ti, Zr and Hf-3Zr carbide deposits synthesized by activated reactive evaporationThin Solid Films, 1974